英语翻译We review the field of thin-film silicon solar cells with an active layer thickness of a few micrometers.These technologies can potentially lead to low cost through lower material costs than conventional modules,but do not suffer from som
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英语翻译We review the field of thin-film silicon solar cells with an active layer thickness of a few micrometers.These technologies can potentially lead to low cost through lower material costs than conventional modules,but do not suffer from som
英语翻译
We review the field of thin-film silicon solar cells with an active layer thickness of a few micrometers.These technologies can potentially lead to low cost through lower material costs than conventional modules,but do not suffer from some critical drawbacks of other thin-film technologies,such as limited supply of basic materials or toxicity of the components.Amorphous Si technology is the oldest and best established thin-film silicon technology.Amorphous silicon is deposited at low temperature with plasma-enhanced chemical vapor deposition (PECVD).In spite of the fundamental limitation of this material due to its disorder and metastability,the technology is now gaining industrial momentum thanks to the entry of equipment manufacturers with experience with large-area PECVD.
英语翻译We review the field of thin-film silicon solar cells with an active layer thickness of a few micrometers.These technologies can potentially lead to low cost through lower material costs than conventional modules,but do not suffer from som
我们回顾薄膜硅太阳能电池的领域与一些个测微表的一种活跃层数厚度的.这些技术比常规模块可能潜在地导致低成本通过更低的物质费用,但是不遭受其他薄膜技术一些重要缺点,例如基本材料有限的组分的供应或毒力.无定形的技术是最旧和最佳的建立的薄膜硅技术.无定形的硅被放置在与等离子改进的化学气相沉积(PECVD)的低温.竟管这材料的根本局限由于它的混乱,技术现在获取工业动量由于设备制造商词条与经验的与大区域PECVD.
我们检讨领域式薄膜硅太阳电池与积极层厚度的一个几微米。这些技术有可能导致成本低,通过降低材料成本比传统的模块,但不要因一些关键的弊端,其他采用薄膜技术,如供应量有限的基本材料或毒性的组成部分。非晶硅技术是最古老的和最佳成立式薄膜硅技术。非晶硅是存放在低温等离子体增强化学气相沉积(等离子体增强化学气相沉积) 。尽管该国的根本限制,这种材料由于其无序和亚稳态,此技术现已获得工业的势头,由于进入设备制造...
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我们检讨领域式薄膜硅太阳电池与积极层厚度的一个几微米。这些技术有可能导致成本低,通过降低材料成本比传统的模块,但不要因一些关键的弊端,其他采用薄膜技术,如供应量有限的基本材料或毒性的组成部分。非晶硅技术是最古老的和最佳成立式薄膜硅技术。非晶硅是存放在低温等离子体增强化学气相沉积(等离子体增强化学气相沉积) 。尽管该国的根本限制,这种材料由于其无序和亚稳态,此技术现已获得工业的势头,由于进入设备制造商与经验,与大面积等离子体增强化学气相沉积。
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