英语翻译As the semiconductor industry moves to processes for linewidths of 65nm and beyond,there is the need for a newcleaning scheme addressing various new issues of thenano world.The ongoing trend to lower concentrationmixtures in critical wafe

英语翻译As the semiconductor industry moves to processes for linewidths of 65nm and beyond,there is the need for a newcleaning scheme addressing various new issues of thenano world.The ongoing trend to lower concentrationmixtures in critical wafe
英语翻译
As the semiconductor industry moves to processes for line
widths of 65nm and beyond,there is the need for a new
cleaning scheme addressing various new issues of the
nano world.The ongoing trend to lower concentration
mixtures in critical wafer cleaning now comes to its
ultimate climax by reducing the concentration down to a
single digit ppm level,and then to ultra low
concentrations far below 1 ppm,making use of a whole
new part of physics:Quantum Electro Dynamics and the
formation of “clusters”.First we will outline the nature
and the benign behaviour of the “clusters”.The study
focuses on the inline test results of the first clustered clean
application in semiconductor manufacturing environment
enabling us to compare the performance of the clustered
clean to the standard RCA clean of the fab.
Clusters formation of ions in very dilute solutions and
their physical properties has been described by Shui-Yin
Lo [1,2] in 1996.Once the Megasonics energy has
detached the particles off the surface,the clustered water
holds the particles in the fluid as it is creating a zeta
potential between the wafer surface and the now liquid
borne particles.Thus,preventing a redeposition on the
wafer surface,the particles now can be transported off the
Processing area by overflow rinse.The scope of this work
was to prove and compare the Particle Removal
Efficiency (PRE) of this new cleaning method with
standard RCA Clean.
E
The cleaning te
Std 200mm RCA cleaning bench supplied by Steag.This
recirculating bath is running a standard SC-1 process of
1:2:50@65°C and is equipped with a Metronics
Megasonics system and an array of 12 transducers
attached to the bottom of the bath.For cleaning efficiency
tests 200mm wafers were prepared with approx.4000
silicon nitride particles deposited homogeneously on the
hydrophilic wafer surface.Particle numbers were
determined by a light Scattering S6XY0 KLA Tencor
Equipment @ 0,2μm.Another set of tests were run using
particles at 78nm diameter.For creating the clustered
water the CS-1000 unit of Nano Green Technology Inc
was installed in the Cleanroom next to the RCA System.
This tool creates clustered water by using ammonia gas
and megasonics.
R
T
same PRE as Std.RCA procedures.Yet there is a
significant difference in the removal rate of silicon oxide.
As the integration race goes on a low etch rate in
cleaning will be one of the key factors to a successful
wafer cleaning strategy,making the clustered clean by
Nano Green Technology Inc.[3] a very interesting new
alternative for addressing the technology needs of todays
cutting edge production and the requirements of the years
to come.

英语翻译As the semiconductor industry moves to processes for linewidths of 65nm and beyond,there is the need for a newcleaning scheme addressing various new issues of thenano world.The ongoing trend to lower concentrationmixtures in critical wafe
全不自动人工翻的喔~
1
随着半导体的线宽已经超过65纳米,我们需要更为科学的清洁半导体的方法来解决纳米领域出现的种种新的问题.现在 用低浓度混合物来清洗薄晶片的方法已经达到了登峰造极的地步,根据量子动力学的原理和集群的形成原理,人们把低浓度混合物的浓度降至了百万分之一以下.其中最重要的是要先将集群的性质分组.这项研究是半导体管内清洁应用的第一例研究,从而为我们比较美国无线电公司（RCA）晶圆厂的清洁水平提供了可能.
在1996年 Shui-Yin Lo教授（获得物理大奖的一中国的物理学家）就已经对在离子在冲淡环境下的集群和他们的物理特性.
待续 我去吃饭 回来帮你整 分儿留着给我哈
2
超高频清洗技术的已经可以清洗掉管表面的灰尘粒子,当使用超高频清洗技术进行清理,集群水离子就会锁住在水中的灰尘粒子从而在晶圆片和新形成的粒子中形成ZETA潜质(我不知道这个是你们专业里的什么东东).故,驱离水液,而后即可溢流清除掉灰尘粒子.这项研究也达到了其意图：比较和证明Particle Removal
Efficiency (PRE)RCA的新原理 气枪喷嘴除尘效率 of this new cleaning method with standard RCA Clean.
3The cleaning te Std 200mm RCA cleaning bench 这种流水线是由德国的STEAG公司生产出售的.这种循环恒温槽在SC-1浓度下运行.
待续 没剩多少了 明天上午帮你搞定